Rocky Mountain Vacuum tech

Specialized company in the development of vacuum system
for semiconductor device fabrication

ROCKY MOUNTAIN
VACUUM TECH

Specialized company in the development of vacuum system
for semiconductor device fabrication

ROCKY MOUNTAIN
VACUUM TECH

Specialized company in the development of vacuum system
for semiconductor device fabrication

ROCKY MOUNTAIN
VACUUM TECH

Specialized company in the development of vacuum system
for semiconductor device fabrication

ROCKY MOUNTAIN
VACUUM TECH

Specialized company in the development of vacuum system
for semiconductor device fabrication

ROCKY MOUNTAIN
VACUUM TECH

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Josephson Junction System

This is the Josephson Junction System product supplied by Rocky Mountain Vacuum tech.

JDR-E Series

A Josephson junction is a key component designed to allow electrons to travel through quantum tunneling through a thin insulating layer connecting two superconductors. Although this structure is miniscule in size that it is invisible to the naked eye, it plays a crucial role in implementing qubits, the fundamental unit of quantum computers, by precisely controlling current and phase. This technology is now a key factor of the development of superconducting quantum computers.
JDR-E Series

Aluminum is considered the most suitable material for fabricating Josephson junctions. The naturally formed thin, uniform oxide film (Al₂O₃) provides a stable insulating layer, enabling precise control of current and phase. Furthermore, its simple and highly reproducible process facilitates large-scale quantum chip fabrication, and its low noise makes it ideal for securing long qubit (coherence time) performance. These properties have made aluminum a key material for today's superconducting quantum computers.
JDR-S Series

Neobium (Nb) sputtering is an essential process for fabricating Josephson junctions. Nebium possesses a higher critical temperature and more stable superconducting properties than aluminum, enabling the fabrication of more reliable quantum devices. The uniform, dense films formed through the sputtering process are optimized for large-scale integrated circuit fabrication and are positioned as a key foundational technology driving the development of superconducting quantum computers.
JDR-I Series

Ion beam etching is a microfabrication process essential for fabricating Josephson junctions. Josephson junctions, which involve nanometer-thick insulating and superconducting layers, require extreme precision. Ion beam etching selectively removes only unnecessary components, creating a clean and uniform junction surface and optimizing intermetal contact characteristics to ensure stable supercurrent flow. This precision processing technology is a key enabler for high-performance qubit implementation and large-scale quantum chip fabrication.